身上的壳好重，我爬得好慢，那树的顶端离我还是那么遥远，但是我一步一步地往上爬，只要坚持不懈就一定会到底的，对吧？

今天这种情况是因为我曾经停下来，停了一年半，我现在是在为那一年半付出代价，但是我还是恳求上帝能饶恕我一些，对我的惩罚不要太重，给我一个弥补的机会，我发誓在以后的人生旅途中我决不会再让我停滞不前！无论爬得多慢，我都要坚持下去！我可以瞥瞥路上的风景，但是决不能因此忘记了前进的方向！

心一则成，我坚信！只要一心一意地追求目标就一定能梦想成真！

蜗牛，爬吧。。。

The world changes so quickly that I can not even prepare accepting the changes.
Is it because I fall behind and can not come up with the speed of changes,or it changes really too quickly?

Several days ago she still told me how bad he is,but now they are together!I am really startled!Maybe I am too dull!My God!I am really hit by the news that they have been together.I can not even believe it!However,I wish they have a beautiful life forever.

Now I believe love exists everywhere.However,I do not know when I will believe my ability to own it.

In a word,the world changes too quickly,but I do not want to change my decision.

一直以来生活里只有压得我喘不过气来的烦恼，今天终于有了一件让我最开心的事：最疼我的二哥有了个儿子！真是苍天有眼，好人有好报！
二哥的温良，孝顺，对家人的关心和爱护，对朋友的真诚和慷慨，对工作的认真和热忱，亲友们都是看在眼里的。他从来只是真诚的付出，不求别人的回报，老天一定被感动了吧！给他一个幸福的婚姻，幸福的家庭，顺利的事业，是对他最大的肯定!
其实都是他自己默默无闻的奉献才得来的今天的一切。。。
他，过着平静而幸福满足的生活，有幸福的家庭，有真诚的朋友，有自足的事业。祝福他，永远幸福如意！

我，他一直疼爱的妹妹，就这样折腾着，苦了爸妈，累了哥哥，虚了自己，仿佛不知道明天的路伸向何方，一直苦苦地求索，披荆斩棘，伤痕累累，每个日子都是灰色的，然而，今天得知二哥有了个儿子，我是如此感动，如此欢喜：一直付出的二哥终于有了幸福！
从高中开始，二哥就一直无条件地关心我照顾我，让我走过了灰色的高考，黑色的复读，迷茫的大学，我该有多大的感激啊！就只因为我是他的妹妹，他就无私地关照我，这是几世才修来的缘！是啊，我是三个哥哥们的妹妹，这是我几辈子修来的缘份呢？而二哥，撑起了我们家的三分之一天，撑起了我曾经的半边天，让我可以毫无后顾之忧地勇往直前，这又是我如何能修来的福气呢？感谢上苍，感谢生活！
我是姑姑了，一定要努力奋斗，好好疼爱小侄子！

二哥，祝福你永远幸福如意！

1月21日补充：
二哥现在并不怎么幸福，其实，因为那小家伙让人很不省心，我是后来才知道的。我为此感到万分遗憾。无能的我却帮不上多大的忙。。。不，我要奋起，尽我最大的可能帮点忙！小家伙啊，你一定要健健康康地长大，而且不要辜负望子成龙的期望！

放弃记录历史，选择忘记。
记下教训：要坚持，自制，要聪明，会装糊涂。

事业：方向已知，但仍需继续探索。
爱情：奢侈品。

家庭：宽容，信任，爱护。

朋友：珍惜，真诚。

学业：目前的主要矛盾，看着办吧。

不是成 功 放 弃 了 我 ,而 是 我 放 弃 了 成 功 .
不 是 失 败 选 择 了 我 ,而 是 我 选 择 了 失 败 .

不 是 机 会 不 来 找 我 ,而 是 机 会 到 来 时 我 抓 不 住 .

不 是 婚 姻 让 人 摆 脱 孤 单 ,而 是 爱 情 让 人 有 了 战 胜 一 切 的 勇 气.

 不 是 不 会 心 想 事 成 ,而 是 愿 望 不 够 强 烈 不 够 坚 持 .

世 上 无 难 事 ,只 怕 有 心 人 ! 游戏规则

1.找一个一定时间内可以完成的目标，确定要完成的事情和具体的完成时间 2.每天强制自己花费一定时间去完成目标 3.完成目标的过程中，留下一些阶段性的标志(也是可以是当前的最近进度，体会感悟等等) 4.完成时间截至时，检查目标的完成程度。 5.如果完成，制定新的目标玩下一关；   如果失败，要有一定的惩罚，并在当前基础上，迭代开始再一次游戏。

 2007年11月14日23时
初定目标，Introduction to Microlithography,共493页，打算一天看30页，17天看完。
由于下周二有考试，决定下周二才开始执行。
先写下目标，以防忘记。

11月20日22：40时
今天没看！

19.12.2007,21:22
Ich habe das Buch nicht gelesen.Schade!Entschuldigung!
Ich weiß nicht,was ich seit 21.11.2007 gemacht habe.
Was kann ich tun?
Irgendwie,ich muss mich strafen,deshalb  wird ich  mich von drei Tagen keine  Chance geben,falsche Wörter  zu sagen.Es ist wirklich sehr schwierig,weil ich oft mehre Fehler mache,wenn ich mit andere rede.

20.12.2007,00:10
I have read only five pages.Alas.
I read very slowly,as it seems to be difficult for me to understand or maybe  because I did not concentrate on it when reading.
It is something about some problems existing in X-lithography and some requirements of x-lithography mask fabrication.

24.12.2007,0:30
Another five pages.
1.Resolution in x-ray lithography is determined by the fate of the photoelectron that is generated by absorption of an x-ray photon in the resist.The larger the photon energy is,the longer the range of photoelectrons,and the better the resolution.
2.the next requirement of an x-ray lithography is a bright x-ray source.
(1)Power  output of the sources based on electron bombardment is not high enough.
(2)Alternative sources are hot plasma and synchrotrons.
1)A hot plasma source works on the principle of rapidly heating a plasma (laser-produced).
2)Synchrotron depends on changing the direction of relativistic electrons such that the emitted radiation in the range of 1nm.
The beam is highly collimated so that t eliminates the penumbral effects associated with electron-impact sources.Likewise,control of the mask-wafer gap is not critical.Consequently,resolution is primarily limited by Fresnel diffraction effects and the range of the ejected photo-Auger electrons.
(3)X-ray projection lithography with soft X-rays.
1)The system consists of a multilayer-coated,Schwarzschild,x-ray reduction optic projecting a 5x-redued image of an X-ray reflecting mask onto a resist-coated wafer.This specific design requires normal incidence spherical mirrors and a reflecting X-ray mask formed b patterning normal-incidence,soft X-ray multilayer mirrors.
2)Projection X-ray lithography offers several advantages over proximity printing:the ability to demagnify the image means that 1:1 replication is no longer required,and the need for a submicrometer mask technology with its attendant diffiulties is eliminated;a reflecting mask would be more robust nd have higher contrast than a transmission mask.
3)Challenges: the design and fabrication of masks and precision optical elements,alighment,system metrology,and feedback control.

25.12.2007 2:42
ANOTHER FIVE PAGES.
SOMETHING ABOUT RESIST:
REQUIREMENTS,HIERARCHY.
TWO-COMPONENT RESIST IS BEING READ.

26.12.2007 2:39
Resist Sensitometry
1)response to light
photoefficicency: for diazonaphythoquinone used in positive photoresist it is from 0.2 to 0.3,for that used in negative photoresists it ranges from 0.5 to 1.0.For hotoresensitive polymers used in one-component positive resists it is difficult to determine experimentally,but for PMIPK it is 0.3 at 313nm (for vinylketone polymers a solution one is higher than one in the glassy state).
2)Response to ionizing radiation
molecular weight:it decreases monotonically with increasing dose.
Tomorrow I will find out the reason for the introduction to it and its meanings.

27.12.2007 1:46
149-153
1.The line of the inverse of mocular weight versus dose can be used to get te intrinsic radiation sensitivity,which is determined by the slope of line.Pay attention to the correction factor.
2.Lithographi sensitivity
It is difficult to measure,as it depends on many parameters.The choice of method must depend upon the goals and will require careful interpretation.
1)Positive resist sensitometry
The laser end-point detection system is used to get data for the curve which can provide information about the sensitivity,or dose response.The principle of the system is interference.
Tomorrow I will find out what is the meaning of those curves.

28.12.2007 2:20
154-159
1)The curve of the thickness remaining versus log dose:the lower is Ds(defined by man),the higher is the sensitivity; the larger is the slope,the higher is the contrast.
2)The experiment measuring the curve:for negative resist,under optical exposure,the resists should be exposed hrough the substrate from the back side,to obtain meaningful data.
3)The value Ds is of little value unless accompanied by a definition of  Ds and detaild description of the conditions under which it was measured,including at the minimum,the initial film tickness;the charateristics of the substrate;the temperature and time of the post- and prebake;the characteristics of the exposing radiation;an the developer compositon,time,and temperature;the structure,copolymer ratio,sequence distribution,molecular weight,and dispersity of polymers include in the formulation.It is discussed in greater detail in Chapter 4,which I will cover tomorrow.

29.12.2007 2:32
Chapter 4
1)five stages involved in the ivention and implementation of new and viable resist systems:
a.fundamental researh on new polymer and radiation chemistr
b.synhesis and characterization of potential materials
c.lithographic evaluation of formulations
d.engineering scaleup of the synthesis of a specific,identified material
e.process development for manufacturing application
2)The sensitivity and contrast of a resist are primarily determined by the properties of the polymer and the processing parameters.
The polymer properties include
chemical composition,molecular weight,molecular weight distribution,glass transition temperature(Tg),density,quantum efficiency,average atomic number(for X-ray,eletron-beam,and ion-beam methods),optical density.
The processing parameters include
developing criteria,developing conditions,developer composition,pre- and postbaking conditions,postexposure bake(chemically amplified resists),processing environment (chemically amplified resists).
Tomorrow I will find out what is molecular weight distribution and its meaning.

29.12.2007 16:36
E-beam resists(also something about molecular weight,but still not its distribution)
1)PMMA offers high resolution,ease of handling,excellent film-forming characteristics,wide processing latitude,and ready availability,but it is insensitive and a less efficient plasma or RIE mask.
Terpolymer resist clearlyy demonstrates a significant improement in sensitivity over PMMA.
2)Styrene resists
a)Polystyrene is seakly sensitive,negative electron resist,but perturbations in the structure have a profound effect on its radiation chemistry,e.g.improve its sensitivity.
b)Reducing dispersity at constant number-average moecular weight results in increased contrast to some limit that is structure dependent;
increased molecular weigtht at constant disersity results in increased sensitivity
c)Swelling distortes images.It is difficult to avoid.
(1)during the development process,the cross-linked areaabsorbs a large volume of solvent and must increase its dimensions,which causes image distortion.
(2)another common manifestation of the swelling is the formation of snake-ike distortions of long,narrow images.
Details of swelling will be covered tomorrow.

我的宏伟蓝图

第一，专注于光电方向的研究，多关注有关于光电的东西，还没有好好利用网络资源，以后得好好利用。
第二，弥补C语言的缺陷，当然同时也是因为有点兴趣的缘故。
第三，休闲：弹钢琴，被看作玩也行，反正是从小就有的爱好了，这次再也不放弃了。


希望自己快快长大独立。。。。  以下是关于Linux 的一些东西, 希望大家能在一开始就跟随经典, 高层次地进行学习, 不要像我一样走了太多的弯路. 顺便说一句Linux 下最常用的编译器是gcc, 在以后的文章里会有关于它的介绍.

    一．核心源程序的文件组织:

    1．Linux核心源程序通常都安装在/usr/src/linux下，而且它有一个非常简单的编号约定：任何偶数的核心（例如2.0.30）都是一个稳定的核心，而任何奇数的核心（例如2.1.42）都是一个开发中的核心. 以下内容基于稳定的2.2.5源代码.
    2．核心源程序的文件按树形结构进行组织，在源程序树的最上层你会看到这样一些目录:
    ●Arch：arch子目录包括了所有和体系结构相关的核心代码. 它的每一个子目录都代表一种支持的体系结构，例如i386就是关于Intel cpu及与之相兼容体系结构的子目录. PC机一般都基于此目录.
    ●Include: include子目录包括编译核心所需要的大部分头文件. 与平台无关的头文件在 include/linux子目录下，与 Intel cpu相关的头文件在include/asm-i386子目录下, 而include/scsi目录则是有关scsi设备的头文件目录.
    ●Init：这个目录包含核心的初始化代码(注：不是系统的引导代码)，包含两个文件main.c和Version.c，这是研究核心如何工作的一个非常好的起点.
    ●Mm: 这个目录包括所有独立于 cpu 体系结构的内存管理代码，如页式存储管理内存的分配和释放等；而和体系结构相关的内存管理代码则位于arch/*/mm/，例如arch/i386/mm/Fault.c
    ●Kernel: 主要的核心代码，此目录下的文件实现了大多数linux系统的内核函数，其中最重要的文件当属sched.c；同样，和体系结构相关的代码在arch/*/kernel中.
    ●Drivers: 放置系统所有的设备驱动程序;每种驱动程序又各占用一个子目录：如，/block 下为块设备驱动程序，比如IDE设备(ide.c). 如果你希望查看所有可能包含文件系统的设备是如何初始化的，你可以看drivers/block/genhd.c中的device_setup(). 它不仅初始化硬盘，也初始化网络，因为安装nfs文件系统的时候需要网络. 其他: 如, Lib放置核心的库代码; Net, 核心与网络相关的代码; Ipc, 这个目录包含进程间通讯的代码; Fs, 所有的文件系统代码和各种类型的文件操作代码，它的每一个子目录支持一个文件系统，例如fat和ext2; Scripts, 此目录包含用于配置核心的脚本文件等. 一般，在每个目录下，都有一个 .depend 文件和一个 Makefile 文件，这两个文件都是编译时使用的辅助文件，仔细阅读这两个文件对弄清各个文件这间的联系和依托关系很有帮助；而且，在有的目录下还有Readme 文件，它是对该目录下的文件的一些说明，同样有利于我们对内核源码的理解.

    第一期就先写到这里, 谢谢观赏!

只顾长大，我要成长起来，独立起来，不再害怕黑夜，不再害怕闪电．．．
不怕，不再怕．．．

长大，只顾长大，我的脑袋已经自由了，我可以去做我该做的，我懂得怎样生活才会开心了，我知道我该做什么了，我知道我该怎样做了．．．

只顾长大，不用怕．．．